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Proceedings Paper

Thin crystal development and applications for hard x-ray free-electron lasers
Author(s): Taito Osaka; Makina Yabashi; Yasuhisa Sano; Kensuke Tono; Yuichi Inubushi; Takahiro Sato; Kanade Ogawa; Satoshi Matsuyama; Tetsuya Ishikawa; Kazuto Yamauchi
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Paper Abstract

We have developed a new method to fabricate ultrathin silicon single crystals, which can be used as spectral beam splitters for the hard x-ray regime, based on a reactive dry etching process using plasma at atmospheric pressure. The high crystalline perfection of the crystals was verified by both topographic and high-resolution rocking curve measurements using coherent x-rays at the 1-km-long beamline, BL29XUL of SPring-8. The development of thin crystals enables the construction of a split-delay unit and the provision of a dedicated branch for photon diagnostics. By using a 20-μm-thick Si(111) crystal in the symmetric Bragg geometry as a component of a Si(111) double-crystal monochromator, an arrival-time monitor using a destructive manner has been upgraded to a non-destructive method at SPring-8 Angstrom Compact free-electron LAser. Using the splitting crystals in a helium atmosphere can prevent oxidation, which can introduce a lattice distortion.

Paper Details

Date Published: 27 September 2013
PDF: 8 pages
Proc. SPIE 8848, Advances in X-Ray/EUV Optics and Components VIII, 884804 (27 September 2013);
Show Author Affiliations
Taito Osaka, Osaka Univ. (Japan)
Makina Yabashi, RIKEN SPring-8 Ctr. (Japan)
Yasuhisa Sano, Osaka Univ. (Japan)
Kensuke Tono, Japan Synchrotron Radiation Research Institute (Japan)
Yuichi Inubushi, RIKEN SPring-8 Ctr. (Japan)
Takahiro Sato, RIKEN SPring-8 Ctr. (Japan)
The Univ. of Tokyo (Japan)
Kanade Ogawa, RIKEN SPring-8 Ctr. (Japan)
Satoshi Matsuyama, Osaka Univ. (Japan)
Japan Science and Technology Agency, CREST (Japan)
Tetsuya Ishikawa, RIKEN SPring-8 Ctr. (Japan)
Kazuto Yamauchi, Osaka Univ. (Japan)
Japan Science and Technology Agency, CREST (Japan)

Published in SPIE Proceedings Vol. 8848:
Advances in X-Ray/EUV Optics and Components VIII
Ali Khounsary; Shunji Goto; Christian Morawe, Editor(s)

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