
Proceedings Paper
Fast hologram pattern generation by wave field translationFormat | Member Price | Non-Member Price |
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Paper Abstract
In this paper, we present a fast hologram pattern generation method to overcome accumulation problem of point source
based method. Proposed method consists of two steps. In the first step, 2D projection of wave field for 3D object is
calculated by radial symmetric interpolation (RSI) method to the multiple reference depth planes. Then in the second
step, each 2D wave field is translated toward SLM plane by FFT based algorithm. Final hologram pattern is obtained by
adding them. The effectiveness of method is proved by computer simulation and optical experiment. Experimental
results show that proposed method is 3878 times faster than analytic method, and 226 times faster than RSI method.
Paper Details
Date Published: 26 September 2013
PDF: 7 pages
Proc. SPIE 8855, Optics and Photonics for Information Processing VII, 885508 (26 September 2013); doi: 10.1117/12.2022810
Published in SPIE Proceedings Vol. 8855:
Optics and Photonics for Information Processing VII
Khan M. Iftekharuddin; Abdul A. S. Awwal; Andrés Márquez, Editor(s)
PDF: 7 pages
Proc. SPIE 8855, Optics and Photonics for Information Processing VII, 885508 (26 September 2013); doi: 10.1117/12.2022810
Show Author Affiliations
S. Lee, Samsung Electronics, Co., Ltd. (Korea, Republic of)
H. C. Wey, Samsung Electronics, Co., Ltd. (Korea, Republic of)
H. C. Wey, Samsung Electronics, Co., Ltd. (Korea, Republic of)
D. K. Nam, Samsung Electronics, Co., Ltd. (Korea, Republic of)
D. S. Park, Samsung Electronics, Co., Ltd. (Korea, Republic of)
D. S. Park, Samsung Electronics, Co., Ltd. (Korea, Republic of)
Published in SPIE Proceedings Vol. 8855:
Optics and Photonics for Information Processing VII
Khan M. Iftekharuddin; Abdul A. S. Awwal; Andrés Márquez, Editor(s)
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