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Proceedings Paper

High-power and narrow-band excimer laser with a polarization-coupled resonator
Author(s): Nobuaki Furuya; Takuhiro Ono; Naoya Horiuchi; Keiichiro Yamanaka; Takeo Miyata
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Paper Abstract

As a light source for deep submicron lithography the authors have developed a long life and high power KrF narrow band excimer laser by installing a polarization coupled resonator into the conventional narrow band excimer laser with intra-cavity etalons. A maximum output power of 1O. 5Yi with a low etalon-load of L5W arid a narrow spectral band-width of 24pm at 200Hz is obtained. The central wavelength is stabilized to within only 5pm and drift is not observed when increasing the repetition rate from 4Hz to 200Hz without a wavelength feedback loop system. Furthermore the etalon-life is expected to be drastically prolonged to over a billion pulses resulting from the reduction of the etalonload to only about 10 of that in a conventional laser. 2.

Paper Details

Date Published: 1 June 1990
PDF: 12 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20221
Show Author Affiliations
Nobuaki Furuya, Matsushita Research Institute Tokyo, Inc. (Japan)
Takuhiro Ono, Matsushita Research Institute Tokyo, Inc. (Japan)
Naoya Horiuchi, Matsushita Research Institute Tokyo, Inc. (Japan)
Keiichiro Yamanaka, Matsushita Research Institute Tokyo, Inc. (Japan)
Takeo Miyata, Matsushita Research Institute Tokyo, Inc. (Japan)

Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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