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Proceedings Paper

PS-b-PAA as a high X polymer for directed self-assembly: a study of solvent and thermal annealing processes for PS-b-PAA
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Paper Abstract

Poly(styrene)-b-poly(acrylic acid) copolymers (PS-b-PAA) was shown to be one promising material for achieving substantially smaller pitch patterns than PS-b-PMMA while still retaining high etch contrast and application for chemoepitaxy. Phase separation of acetone vapor annealed PS-b-PAA (Mw=16,000 g/mol with 50:50 volume ratio of PS: PAA) on PS brush achieved a lamellar morphology with a pattern pitch size (L0) of 30 nm. However the thermal annealing of the same PS-b-PAA generated a dramatically larger pitch size of 43 nm. SEM and GPC analysis revealed that the intermolecular crosslinking during thermal annealing process has increased the effective N (degree of polymerization), which suggests that even a small amount of crosslinking would lead to big pitch change. Thus, PS-b-PAA is not suitable for fast thermal annealing process as it loses pitch size control due to PAA crosslinking.

Paper Details

Date Published: 5 April 2013
PDF: 4 pages
Proc. SPIE 8680, Alternative Lithographic Technologies V, 86801V (5 April 2013); doi: 10.1117/12.2021414
Show Author Affiliations
Jing Cheng, Georgia Institute of Technology (United States)
Richard A. Lawson, Georgia Institute of Technology (United States)
Wei-Ming Yeh, Georgia Institute of Technology (United States)
Nathan D. Jarnagin, Georgia Institute of Technology (United States)
Laren M. Tolbert, Georgia Institute of Technology (United States)
Clifford L. Henderson, Georgia Institute of Technology (United States)

Published in SPIE Proceedings Vol. 8680:
Alternative Lithographic Technologies V
William M. Tong, Editor(s)

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