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Proceedings Paper

Water-window microscopy using compact, laser-plasma source based on Ar/He double stream gas-puff target
Author(s): Przemyslaw W. Wachulak; Marcin Skorupka; Andrzej Bartnik; Jerzy Kostecki; Roman Jarocki; Mirosław Szczurek; Lukasz Wegrzynski; Tomasz Fok; Henryk Fiedorowicz
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Paper Abstract

Photon-based (bosonic-type) imaging at short wavelength vs. electron, or recently neutron, imaging has additional advantages due to different interaction of photons with matter and thus high resolution photon-based imaging is still of high interest to the scientific community. In this work we try to combine the advantages of employing compact, laboratory type laser-plasma short wavelength source, based on Ar/He gas puff target, emitting incoherent radiation, with the “water-window” spectral range. This unique combination is highly suitable for biological imaging, and allows developing a small size microscopy setup, which might be used in various fields of science and technology. Thus, in this paper we report on recent advances in “water-window” desk-top microscopy setup employing a laser-plasma SXR source based on a double stream gas puff target and Wolter type-I objective. The system allows capturing magnified images of the objects with ~1 μm spatial resolution up to ~40 μm thickness and single SXR pulse exposure time as low as 3 ns. For the SXR microscope Ar plasma was produced by focusing of the pumping laser pulses, from Nd:YAG laser (Eksma), by a lens onto a gas puff target. EUV radiation from the plasma was collected and focused by an ellipsoidal, axi-symmetrical nickel coated condenser mirror, developed by Rigaku, Inc. The condenser is a broad-band optic, capable of efficiently reflecting radiation from the EUV range down to SXR region with energy cut-off of ~800 eV. To spectrally narrow the emission from argon plasma a free-standing titanium filter (Lebow) was used. Spectrally filtered radiation illuminates the sample. Then the sample was imaged onto a SXR sensitive back-illuminated, CCD camera (Andor) by a Wolter type-I reflective objective. A characterization and optimization of both the source and the microscope setups are presented and discussed.

Paper Details

Date Published: 3 May 2013
PDF: 8 pages
Proc. SPIE 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III, 877719 (3 May 2013); doi: 10.1117/12.2021154
Show Author Affiliations
Przemyslaw W. Wachulak, Military Univ. of Technology (Poland)
Marcin Skorupka, Military Univ. of Technology (Poland)
Andrzej Bartnik, Military Univ. of Technology (Poland)
Jerzy Kostecki, Military Univ. of Technology (Poland)
Roman Jarocki, Military Univ. of Technology (Poland)
Mirosław Szczurek, Military Univ. of Technology (Poland)
Lukasz Wegrzynski, Military Univ. of Technology (Poland)
Tomasz Fok, Military Univ. of Technology (Poland)
Henryk Fiedorowicz, Military Univ. of Technology (Poland)

Published in SPIE Proceedings Vol. 8777:
Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III
Libor Juha; René Hudec; Ladislav Pina; Saša Bajt; Richard London, Editor(s)

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