Share Email Print

Proceedings Paper

Sub-nanometer in-die overlay metrology: measurement and simulation at the edge of finiteness
Author(s): Henk-Jan H. Smilde; Martin Jak; Arie den Boef; Mark van Schijndel; Murat Bozkurt; Andreas Fuchs; Maurits van der Schaar; Steffen Meyer; Stephen Morgan; Kaustuve Bhattacharyya; Guo-Tsai Huang; Chih-Ming Ke; Kai-Hsiung Chen
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The target size reduction for overlay metrology is driven by the optimization of the device area. Furthermore, for the future semiconductor nodes accurate metrology on the order of 0.2 nm is necessary locally in the device area, requiring small in-die targets that fit within the product structures on the wafer. In this, the diffraction-based overlay metrology using optical scatterometry is challenged to extreme limits. The small grating cannot be considered as an infinitely repeating line-space structure with a sharply peaked spectrum, however a continuous spectrum is observed. Also, metrology proximity effects due to the environment near the metrology target need to be taken into account. On the one hand, this sets strict design and assembly rules of the metrology sensor. On the other hand, the optical ray-based analysis is extended to wave-based analysis to capture the full extent of the overlay application and sensor. In this publication, the challenges of sub-nanometer in-die overlay metrology are addressed, including measurements and simulations.

Paper Details

Date Published: 13 May 2013
PDF: 6 pages
Proc. SPIE 8788, Optical Measurement Systems for Industrial Inspection VIII, 87881N (13 May 2013); doi: 10.1117/12.2020930
Show Author Affiliations
Henk-Jan H. Smilde, ASML Netherlands B.V. (Netherlands)
Martin Jak, ASML Netherlands B.V. (Netherlands)
Arie den Boef, ASML Netherlands B.V. (Netherlands)
Mark van Schijndel, ASML Netherlands B.V. (Netherlands)
Murat Bozkurt, ASML Netherlands B.V. (Netherlands)
Andreas Fuchs, ASML Netherlands B.V. (Netherlands)
Maurits van der Schaar, ASML Netherlands B.V. (Netherlands)
Steffen Meyer, ASML Netherlands B.V. (Netherlands)
Stephen Morgan, ASML Netherlands B.V. (Netherlands)
Kaustuve Bhattacharyya, ASML Netherlands B.V. (Netherlands)
Guo-Tsai Huang, TSMC Ltd. (Taiwan)
Chih-Ming Ke, TSMC Ltd. (Taiwan)
Kai-Hsiung Chen, TSMC Ltd. (Taiwan)

Published in SPIE Proceedings Vol. 8788:
Optical Measurement Systems for Industrial Inspection VIII
Peter H. Lehmann; Wolfgang Osten; Armando Albertazzi, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?