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Proceedings Paper

Nanometrology of periodic nanopillar arrays by means of light scattering
Author(s): Oliver Paul; Frank Widulle; Bernd H. Kleemann; Andreas Heinrich
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Paper Abstract

We report on a fast and accurate shape metrology for nanoscale structures by analyzing the scattering pattern of visible light. The technique is based on model-based scatterometry which is inverse measurement technique comparing measured scattering data with numerical simulations of the scattering process using a physical model of the structures. We demonstrate the concept for an array of silicon nanopillars that are arranged in a twodimensional lattice and show that the proposed methodology provides a fast and reliable determination of the pillar dimensions with nanometer precision. Since the technique works contact-free and is applicable to large area samples, it can be readily implemented in an industrial environment for inline metrology applications.

Paper Details

Date Published: 13 May 2013
PDF: 7 pages
Proc. SPIE 8788, Optical Measurement Systems for Industrial Inspection VIII, 87881O (13 May 2013); doi: 10.1117/12.2020880
Show Author Affiliations
Oliver Paul, Carl Zeiss AG (Germany)
Frank Widulle, Carl Zeiss AG (Germany)
Bernd H. Kleemann, Carl Zeiss AG (Germany)
Andreas Heinrich, Carl Zeiss AG (Germany)

Published in SPIE Proceedings Vol. 8788:
Optical Measurement Systems for Industrial Inspection VIII
Peter H. Lehmann; Wolfgang Osten; Armando Albertazzi, Editor(s)

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