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Proceedings Paper

The effect of line roughness on DUV scatterometry
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Paper Abstract

The impact of line-edge (LER) and line-width roughness (LWR) on the measured diffraction patters in extreme ultraviolet (EUV) scatterometry has been investigated in recent publications. Two-dimensional rigorous numerical simulations were carried out to model roughness. Simple analytical expressions for the bias in the mean efficiencies stemming from LER and LWR were obtained. Applying a similar approach for DUV scatterometry to investigate the impact of line roughness we obtain comparable results.

Paper Details

Date Published: 13 May 2013
PDF: 6 pages
Proc. SPIE 8789, Modeling Aspects in Optical Metrology IV, 87890U (13 May 2013); doi: 10.1117/12.2020761
Show Author Affiliations
Mark-Alexander Henn, Physikalisch-Technische Bundesanstalt (Germany)
Sebastian Heidenreich, Physikalisch-Technische Bundesanstalt (Germany)
Hermann Gross, Physikalisch-Technische Bundesanstalt (Germany)
Bernd Bodermann, Physikalisch-Technische Bundesanstalt (Germany)
Markus Bär, Physikalisch-Technische Bundesanstalt (Germany)

Published in SPIE Proceedings Vol. 8789:
Modeling Aspects in Optical Metrology IV
Bernd Bodermann; Karsten Frenner; Richard M. Silver, Editor(s)

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