
Proceedings Paper
Alternative methods for uncertainty evaluation in EUV scatterometryFormat | Member Price | Non-Member Price |
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Paper Abstract
The precise and accurate determination of critical dimensions of photo masks and their uncertainties is important
in the lithographic process to ensure operational reliability of electronic compounds. Scatterometry is known as
a fast, non-destructive optical method for the indirect determination of geometry parameters. In recent years
novel methods for solving the inverse problem of scatterometry have enabled a more reliable determination of
grating parameters. In this article we present results from maximum likelihood parameter estimations based on
numerically simulated EUV scatterometry data. We approximately determine uncertainties of these parameters
by a Monte Carlo method with a limited amount of samplings and by employing the Fisher information matrix.
Furthermore, we demonstrate that the use of incomplete mathematical models may lead to severe distortions in
the calculations of the uncertainties by the approximate Fisher matrix approach as well as to substantially larger
uncertainties for the Monte Carlo method.
Paper Details
Date Published: 13 May 2013
PDF: 8 pages
Proc. SPIE 8789, Modeling Aspects in Optical Metrology IV, 87890T (13 May 2013); doi: 10.1117/12.2020677
Published in SPIE Proceedings Vol. 8789:
Modeling Aspects in Optical Metrology IV
Bernd Bodermann; Karsten Frenner; Richard M. Silver, Editor(s)
PDF: 8 pages
Proc. SPIE 8789, Modeling Aspects in Optical Metrology IV, 87890T (13 May 2013); doi: 10.1117/12.2020677
Show Author Affiliations
Sebastian Heidenreich, Physikalisch Technische Bundesanstalt (Germany)
Mark-Alexander Henn, Physikalisch Technische Bundesanstalt (Germany)
Hermann Gross, Physikalisch Technische Bundesanstalt (Germany)
Mark-Alexander Henn, Physikalisch Technische Bundesanstalt (Germany)
Hermann Gross, Physikalisch Technische Bundesanstalt (Germany)
Bernd Bodermann, Physikalisch Technische Bundesanstalt (Germany)
Markus Bär, Physikalisch Technische Bundesanstalt (Germany)
Markus Bär, Physikalisch Technische Bundesanstalt (Germany)
Published in SPIE Proceedings Vol. 8789:
Modeling Aspects in Optical Metrology IV
Bernd Bodermann; Karsten Frenner; Richard M. Silver, Editor(s)
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