Proceedings Paper
TriPleX waveguide platform: low-loss technology over a wide wavelength range| Format | Member Price | Non-Member Price |
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Paper Abstract
In this article a selection of highlights of the TriPleX™ technology of LioniX is given. The basic waveguide technology is explained with recent benchmark measurements done by University California Santa Barbara (UCSB) and University Twente (UT-TE). In order to show the low loss transparency over a wide wavelength range three examples of applications in different wavelength regimes are described in more detail. These are the Integrated Laser Beam Combiner (ILBC) of XiO Photonics in the visible light, a ringresonator sensing platform of LioniX around 850 nm and a phased array antenna with an Optical Beam Forming Network in the 1550 nm band. Furthermore it is shown that the technology is easily accessible via Multi Project Wafer Runs for which the infrastructure and design libraries are also set up.
Paper Details
Date Published: 22 May 2013
PDF: 13 pages
Proc. SPIE 8767, Integrated Photonics: Materials, Devices, and Applications II, 87670E (22 May 2013); doi: 10.1117/12.2020574
Published in SPIE Proceedings Vol. 8767:
Integrated Photonics: Materials, Devices, and Applications II
Jean-Marc Fédéli; Laurent Vivien; Meint K. Smit, Editor(s)
PDF: 13 pages
Proc. SPIE 8767, Integrated Photonics: Materials, Devices, and Applications II, 87670E (22 May 2013); doi: 10.1117/12.2020574
Show Author Affiliations
A. Leinse, LioniX BV (Netherlands)
R. G. Heideman, LioniX BV (Netherlands)
M. Hoekman, LioniX BV (Netherlands)
F. Schreuder, LioniX BV (Netherlands)
F. Falke, LioniX BV (Netherlands)
C. G. H. Roeloffzen, Univ. Twente (Netherlands)
L. Zhuang, Univ. Twente (Netherlands)
R. G. Heideman, LioniX BV (Netherlands)
M. Hoekman, LioniX BV (Netherlands)
F. Schreuder, LioniX BV (Netherlands)
F. Falke, LioniX BV (Netherlands)
C. G. H. Roeloffzen, Univ. Twente (Netherlands)
L. Zhuang, Univ. Twente (Netherlands)
M. Burla, Univ. Twente (Netherlands)
D. Marpaung, Univ. Twente (Netherlands)
D. H. Geuzebroek, XiO Photonics B.V. (Netherlands)
R. Dekker, XiO Photonics B.V. (Netherlands)
E. J. Klein, XiO Photonics B.V. (Netherlands)
P. W. L. van Dijk, SATRAX B.V. (Netherlands)
R. M. Oldenbeuving, SATRAX B.V. (Netherlands)
D. Marpaung, Univ. Twente (Netherlands)
D. H. Geuzebroek, XiO Photonics B.V. (Netherlands)
R. Dekker, XiO Photonics B.V. (Netherlands)
E. J. Klein, XiO Photonics B.V. (Netherlands)
P. W. L. van Dijk, SATRAX B.V. (Netherlands)
R. M. Oldenbeuving, SATRAX B.V. (Netherlands)
Published in SPIE Proceedings Vol. 8767:
Integrated Photonics: Materials, Devices, and Applications II
Jean-Marc Fédéli; Laurent Vivien; Meint K. Smit, Editor(s)
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