
Proceedings Paper
Phase information in coherent Fourier scatterometryFormat | Member Price | Non-Member Price |
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Paper Abstract
Incoherent Optical Scatterometry (IOS) is widely used in semiconductor industry in applications related to optical
metrology particularly in grating reconstruction. Recently, Coherent Fourier Scatterometry (CFS) has emerged as a
strong alternative to the traditional IOS under suitable condition. When available, phase information is an added
advantage in CFS to complement the intensity data. Phase information in the scattered far field is dependent on the
structure and the composition of the grating. We derive and discuss the phase information accessible through the CFS.
Phase difference between the diffracted orders is computed and the polarization dependent phase sensitivity of the
grating parameters are discussed. The results are rigorously simulated and an experimental implementation of CFS
demonstrates the functionality of the method.
Paper Details
Date Published: 13 May 2013
PDF: 8 pages
Proc. SPIE 8788, Optical Measurement Systems for Industrial Inspection VIII, 87881P (13 May 2013); doi: 10.1117/12.2020506
Published in SPIE Proceedings Vol. 8788:
Optical Measurement Systems for Industrial Inspection VIII
Peter H. Lehmann; Wolfgang Osten; Armando Albertazzi, Editor(s)
PDF: 8 pages
Proc. SPIE 8788, Optical Measurement Systems for Industrial Inspection VIII, 87881P (13 May 2013); doi: 10.1117/12.2020506
Show Author Affiliations
N. Kumar, Technische Univ. Delft (Netherlands)
O. El Gawhary, Technische Univ. Delft (Netherlands)
VSL Dutch Metrology Institute (Netherlands)
S. Roy, Technische Univ. Delft (Netherlands)
O. El Gawhary, Technische Univ. Delft (Netherlands)
VSL Dutch Metrology Institute (Netherlands)
S. Roy, Technische Univ. Delft (Netherlands)
S. F. Pereira, Technische Univ. Delft (Netherlands)
H. P. Urbach, Technische Univ. Delft (Netherlands)
H. P. Urbach, Technische Univ. Delft (Netherlands)
Published in SPIE Proceedings Vol. 8788:
Optical Measurement Systems for Industrial Inspection VIII
Peter H. Lehmann; Wolfgang Osten; Armando Albertazzi, Editor(s)
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