
Proceedings Paper
Scatterometry sensitivity analysis for conical diffraction versus in-plane diffraction geometry with respect to the side wall angleFormat | Member Price | Non-Member Price |
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Paper Abstract
Extreme W scatterometry using radiation in the extreme ultraviolet photon energy range, with wavelengths around 13.5 nm, provides direct information on the performance of EUV optical components, e.g. EUV pho tomasks, in their working wavelength regime. Scatterometry with horizontal diffraction geometry, parallel to the grating lines (conical), and vertical scattering geometry, perpendicular to the lines (in-plane), was performed on EUV lithography mask test structures. Numerical FEM based simulations, using a rigorous Maxwell solver, compare both experimental set-ups with focus on the sensitivity of the diffraction intensities particularly with respect to the side wall angle.
Paper Details
Date Published: 13 May 2013
PDF: 10 pages
Proc. SPIE 8789, Modeling Aspects in Optical Metrology IV, 878905 (13 May 2013); doi: 10.1117/12.2020487
Published in SPIE Proceedings Vol. 8789:
Modeling Aspects in Optical Metrology IV
Bernd Bodermann; Karsten Frenner; Richard M. Silver, Editor(s)
PDF: 10 pages
Proc. SPIE 8789, Modeling Aspects in Optical Metrology IV, 878905 (13 May 2013); doi: 10.1117/12.2020487
Show Author Affiliations
Victor Soltwisch, Physikalisch-Technische Bundesanstalt (Germany)
Sven Burger, Zuse Institute Berlin (Germany)
JCMwave GmbH (Germany)
Sven Burger, Zuse Institute Berlin (Germany)
JCMwave GmbH (Germany)
Frank Scholze, Physikalisch-Technische Bundesanstalt (Germany)
Published in SPIE Proceedings Vol. 8789:
Modeling Aspects in Optical Metrology IV
Bernd Bodermann; Karsten Frenner; Richard M. Silver, Editor(s)
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