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Proceedings Paper

Microcircuit lithography using holographic imaging
Author(s): Ray T. Chen; Tin M. Aye; Lev S. Sadovnik; David G. Pelka; Tomasz P. Jannson
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Paper Abstract

TLR holograms have been used to generate 0. 5 jim resolution images with illumination by an Argon laser operating at 457 nm. The contact (proximity) printing geometry compatible with standard wafer processing was used for the recording and reconstruction processes. In order to eliminate the expensive and bulky construction involving a prism a backside holographic wave coupler is proposed. 1.

Paper Details

Date Published: 1 June 1990
PDF: 7 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20199
Show Author Affiliations
Ray T. Chen, Physical Optics Corp. (United States)
Tin M. Aye, Physical Optics Corp. (United States)
Lev S. Sadovnik, Physical Optics Corp. (United States)
David G. Pelka, Physical Optics Corp. (United States)
Tomasz P. Jannson, Physical Optics Corp. (United States)

Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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