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Proceedings Paper

Comprehensive 3-D notching simulator with nonplanar substrates
Author(s): Eytan Barouch; Brian D. Bradie; Uwe Hollerbach; George Karniadakis; Steven A. Orszag
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Paper Abstract

A comprehensive three-dimensional simulation model for non-planar substrate lithography is presented. Matching substrate as well as standing wave effects are examined. The projection printing is simulated using Hopkins'' results and the exposure model is solved using spectral element discretizations of the nonlinear wave equation coupled with the rate equation for the photoactive compound concentrate evolution. The dissolution algorithm describing moving fronts has been modified to handle various topographies thus yielding the final profiles. Results are presented for several test problems. 1.

Paper Details

Date Published: 1 June 1990
PDF: 9 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20198
Show Author Affiliations
Eytan Barouch, Clarkson Univ. (United States)
Brian D. Bradie, Clarkson Univ. (United States)
Uwe Hollerbach, Princeton Univ. (United States)
George Karniadakis, Princeton Univ. (United States)
Steven A. Orszag, Princeton Univ. (United States)

Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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