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Proceedings Paper

Modeling of optical alignment and metrology schemes used in integrated circuit manufacturing
Author(s): Chi-Min Yuan; Andrzej J. Strojwas
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Paper Abstract

The aim ofour work was to develop rigorous models to study various optical alignment and metrology schemes implemented in commercial tools. These schemes indude wafer alignment schemes in steppers and linewidth measurement schemes in optical microscopes. A simulator called METRO based on the models developed has been implemented to facilitate this task. Theoretical and experimental verification efforts have been performed to examine the validity of the simulation results and good agreement has been obtained. By utilizing METRO process engineers can gain more insight into the equipment under operation so as to obtain more accurate alignment and measurement results. Also the equation formulation in METRO is general enough so that optics designers can easily adopt or modify the code to help in devising innovative alignment and metrology schemes. 1.

Paper Details

Date Published: 1 June 1990
PDF: 16 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20189
Show Author Affiliations
Chi-Min Yuan, Carnegie Mellon Univ. (United States)
Andrzej J. Strojwas, Carnegie Mellon Univ. (United States)

Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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