
Proceedings Paper
Thin film coating analysis using a novel IR camera and a broadband Echelle spectrographFormat | Member Price | Non-Member Price |
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Paper Abstract
An echelle spectrograph can provide high resolving power (wavelength/FWHM) across a broad spectral range. These optical instruments are commonly used in spectroscopy for atomic and molecular identification in astronomical observations and laboratory analysis. The wavelength range of an echelle spectrograph is ultimately limited by the capabilities of the detector used to acquire the spectral data. Silicon based CCD, EMCCD and CMOS sensors typically enable measurements from 200nm to 1100nm. Infrared Laboratories and Catalina Scientific Instruments (CSI) have collaborated to demonstrate an application that combines IR Lab’s TRIWAVE camera with CSI’s EMU120/65 echelle spectrograph. The TRIWAVE camera covers a spectral range of 300nm to 1600nm, greatly increasing the wavelength range for applications using the EMU-120/65 spectrograph. With this increased capability, an opportunity exists for measuring the dielectric coating thickness of thin film by extracting and analyzing interference fringes from the spectral data. Methods and results of this measurement will be presented.
Paper Details
Date Published: 18 June 2013
PDF: 9 pages
Proc. SPIE 8704, Infrared Technology and Applications XXXIX, 87042F (18 June 2013); doi: 10.1117/12.2016683
Published in SPIE Proceedings Vol. 8704:
Infrared Technology and Applications XXXIX
Bjørn F. Andresen; Gabor F. Fulop; Charles M. Hanson; Paul R. Norton; Patrick Robert, Editor(s)
PDF: 9 pages
Proc. SPIE 8704, Infrared Technology and Applications XXXIX, 87042F (18 June 2013); doi: 10.1117/12.2016683
Show Author Affiliations
Seth Pappas, Infrared Laboratories, Inc. (United States)
Burt Beardsley, Catalina Scientific (United States)
Burt Beardsley, Catalina Scientific (United States)
George Ritchie, Rider Univ. (United States)
Published in SPIE Proceedings Vol. 8704:
Infrared Technology and Applications XXXIX
Bjørn F. Andresen; Gabor F. Fulop; Charles M. Hanson; Paul R. Norton; Patrick Robert, Editor(s)
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