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Proceedings Paper

Recent advancements in anti-reflective surface structures (ARSS) for near- to mid-infrared optics
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Paper Abstract

Fused silica, YAG crystals, and spinel ceramics substrates have been successfully patterned through reactive ion etching (RIE). Reflection losses as low as 0.1% have been demonstrated for fused silica at 1.06 microns. Laser damage thresholds have been measured for substrates with ARSS and compared with uncoated and/or thin-film anti-reflection (AR) coated substrates. Thresholds as high as 100 J/cm2 have been demonstrated in fused silica with ARSS at 1.06 microns, with ARSS substrates showing improved thresholds when compared with uncoated substrates.

Paper Details

Date Published: 4 June 2013
PDF: 17 pages
Proc. SPIE 8708, Window and Dome Technologies and Materials XIII, 87080P (4 June 2013); doi: 10.1117/12.2016080
Show Author Affiliations
Catalin M. Florea, Sotera Defense Solutions, Inc. (United States)
Lynda E. Busse, U.S. Naval Research Lab. (United States)
Shyam S. Bayya, U.S. Naval Research Lab. (United States)
Brandon Shaw, U.S. Naval Research Lab. (United States)
Ish D. Aggarwal, The Univ. of North Carolina at Charlotte (United States)
Jas S. Sanghera, U.S. Naval Research Lab. (United States)

Published in SPIE Proceedings Vol. 8708:
Window and Dome Technologies and Materials XIII
Randal W. Tustison; Brian J. Zelinski, Editor(s)

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