
Proceedings Paper
Helios: a compact superconducting x-ray source for production lithographyFormat | Member Price | Non-Member Price |
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Paper Abstract
Synchrotron radiation from electron storage rings has the unique
capacity to provide the several kilowatts of continuous X-ray power
necessary for production scale X-ray lithography-. While national
laboratories have developed electron storage ring technology to an
exact science and can provide X-ray beams of an intensity and
quality appropriate for lithography, they have not built machines
optimized for lithography and designed to be replicated in
semiconductor fabrication facilities. Since 1983, Oxford
Instruments have been working on the development of a practical
synchrotron X-ray source, called Helios. Final system tests will
commence this spring on the initial Helios compact synchrotron.
Paper Details
Date Published: 1 May 1990
PDF: 7 pages
Proc. SPIE 1263, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX, (1 May 1990); doi: 10.1117/12.20152
Published in SPIE Proceedings Vol. 1263:
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX
Douglas J. Resnick, Editor(s)
PDF: 7 pages
Proc. SPIE 1263, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX, (1 May 1990); doi: 10.1117/12.20152
Show Author Affiliations
David E. Andrews, Oxford Instruments Ltd. (United States)
M. N. Wilson, Oxford Instruments Ltd. (United Kingdom)
Alistair I.C. Smith, Oxford Instruments Ltd. (United Kingdom)
Vince C. Kempson, Oxford Instruments Ltd. (United Kingdom)
M. N. Wilson, Oxford Instruments Ltd. (United Kingdom)
Alistair I.C. Smith, Oxford Instruments Ltd. (United Kingdom)
Vince C. Kempson, Oxford Instruments Ltd. (United Kingdom)
A. L. Purvis, Oxford Instruments Ltd. (United Kingdom)
R. J. Anderson, Oxford Instruments Ltd. (United Kingdom)
A. S. Bhutta, Oxford Instruments Ltd. (United Kingdom)
Anthony R. Jorden, Oxford Instruments Ltd. (United Kingdom)
R. J. Anderson, Oxford Instruments Ltd. (United Kingdom)
A. S. Bhutta, Oxford Instruments Ltd. (United Kingdom)
Anthony R. Jorden, Oxford Instruments Ltd. (United Kingdom)
Published in SPIE Proceedings Vol. 1263:
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX
Douglas J. Resnick, Editor(s)
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