Share Email Print

Proceedings Paper

Characterization of nanoline based on SEM images
Author(s): Chen-ying Wang; Shu-ming Yang; Qi-jing Lin; Zhuang-de Jiang
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

In this paper, nanolines are fabricated on photoresist using electron beam lithography (EBL) technique. The trapeziform of the cross-section is studied through analysis of the top-down scan electron microscope (SEM) image of the nanolines. Width is not adequate to describe the nanolines. From the SEM image it can be observed that the edge of the nanolines is not straight. Fractal dimension is used to describe the line-edge roughness (LER) of the nanolines. Three different methods are used to calculate the width of the nanolines. Comparing three different values and uncertainty, the true value of the nanolines has been found.

Paper Details

Date Published: 31 January 2013
PDF: 6 pages
Proc. SPIE 8759, Eighth International Symposium on Precision Engineering Measurement and Instrumentation, 87594S (31 January 2013); doi: 10.1117/12.2014506
Show Author Affiliations
Chen-ying Wang, Xi'an Jiaotong Univ. (China)
Tianjin Univ. & Tsinghua Univ. (China)
Shu-ming Yang, Xi'an Jiaotong Univ. (China)
Huazhong Univ. of Science and Technology (China)
Qi-jing Lin, Xi'an Jiaotong Univ. (China)
Zhuang-de Jiang, Xi'an Jiaotong Univ. (China)

Published in SPIE Proceedings Vol. 8759:
Eighth International Symposium on Precision Engineering Measurement and Instrumentation
Jie Lin, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?