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Proceedings Paper

Model for focused ion beam deposition
Author(s): James P. Levin; Patricia G. Blauner; Alfred Wagner
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Paper Abstract

A model of focused ion beam deposition of materials is described. Decomposition of organometallic molecules by ion beams 50-300 nm in diameter allow localized deposition of a variety of metals. The large current density (approximately I A/cm2) and the inherent sputtering of a focused ion beam can result in no net deposition for a variety of process conditions. The major process parameters of current density, beam dwell time, and readsorption time are introduced. Experimental examples of gold depositions from dimethylgold hexafluoro acetylacetonate or DMG(hfac) are presented to illustrate the effect of the process parameters on size and shape of the depositions.

Paper Details

Date Published: 1 May 1990
PDF: 10 pages
Proc. SPIE 1263, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX, (1 May 1990); doi: 10.1117/12.20140
Show Author Affiliations
James P. Levin, IBM Corp. (United States)
Patricia G. Blauner, IBM Corp. (United States)
Alfred Wagner, IBM Corp. (United States)

Published in SPIE Proceedings Vol. 1263:
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX
Douglas J. Resnick, Editor(s)

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