Share Email Print

Proceedings Paper

In situ optical testing of exposure tools via localized wavefront curvature sensing
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

We present a new form of optical testing for exposure tools based on measuring localized wavefront curvature. In this method, offset monopole illumination is used to probe localized regions of the test optic pupil. Variations in curvature manifest as focus shifts, which are measured using a photodiode-based grating-on-grating contrast monitor, and the wavefront aberrations are reconstructed using a least-squares approach. This technique is attractive as it is independent of the numerical aperture of the system and does not require a CCD or a separate interferometer branch.

Paper Details

Date Published: 1 April 2013
PDF: 8 pages
Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 86790Q (1 April 2013); doi: 10.1117/12.2013880
Show Author Affiliations
Ryan Miyakawa, Lawrence Berkeley National Lab. (United States)
Xibin Zhou, SEMATECH Inc. (United States)
Michael Goldstein, SEMATECH Inc. (United States)
Intel Corp. (United States)
Dominic Ashworth, SEMATECH Inc. (United States)
Kevin Cummings, SEMATECH Inc. (United States)
Yu-Jen Fan, SEMATECH Inc. (United States)
Yashesh Shroff, Intel Corp. (United States)
Gregory Denbeaux, Univ. at Albany (United States)
Yudhi Kandel, Univ. at Albany (United States)
Patrick Naulleau, Lawrence Berkeley National Lab. (United States)

Published in SPIE Proceedings Vol. 8679:
Extreme Ultraviolet (EUV) Lithography IV
Patrick P. Naulleau, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?