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Proceedings Paper

Introducing a novel flow to estimate challenges encountered while transitioning from RET development to manufacturable solution
Author(s): Jacky Cheng; Robin Chia; Ying Gong; Omar ElSewefy; GekSoon Chua; YeeMei Foong; Aasutosh Dave; Alvin Chua; DongQing Zhang; Vlad Liubich; Pat Lacour; Alex Tritchkov
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Paper Abstract

Source Mask Optimization (SMO) has become an integral part of resolution enhancement techniques (RET) for almost all critical layers at advanced technology nodes. Over the past couple of years, various flows have emerged for integrating SMO into mainstream RET selection. These flows revolve mainly around clip selection, resist model, verification and analysis metrics, design rule optimization, and so on. There has also been strong emphasis on the quality of mask that is conjugated for source selection process. All these variations in analysis and rigorous simulations for flow selection are critical but they also create a bottleneck in overall RET development. In this paper, we demonstrate an initial RET development flow for 20 nm technology with emphasis on quantifying benefits coming from source and mask. We also report challenges that are encountered in the foundry environment when moving from RET development to production. In conclusion, we demonstrate a reliable solution that could be integrated early in RET development and easily adapted for a production environment.

Paper Details

Date Published: 12 April 2013
PDF: 7 pages
Proc. SPIE 8683, Optical Microlithography XXVI, 86830K (12 April 2013); doi: 10.1117/12.2013605
Show Author Affiliations
Jacky Cheng, GLOBALFOUNDRIES Inc. (Singapore)
Robin Chia, Mentor Graphics Corp. (United States)
Ying Gong, GLOBALFOUNDRIES Inc. (Singapore)
Omar ElSewefy, Mentor Graphics Corp. (United States)
GekSoon Chua, GLOBALFOUNDRIES Inc. (Singapore)
YeeMei Foong, GLOBALFOUNDRIES Inc. (Singapore)
Aasutosh Dave, Mentor Graphics Corp. (United States)
Alvin Chua, Mentor Graphics Corp. (United States)
DongQing Zhang, GLOBALFOUNDRIES Inc. (Singapore)
Vlad Liubich, Mentor Graphics Corp. (United States)
Pat Lacour, Mentor Graphics Corp. (United States)
Alex Tritchkov, Mentor Graphics Corp. (United States)

Published in SPIE Proceedings Vol. 8683:
Optical Microlithography XXVI
Will Conley, Editor(s)

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