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Proceedings Paper

Lithography imaging control by enhanced monitoring of light source performance
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Paper Abstract

Reducing lithography pattern variability has become a critical enabler of ArF immersion scaling and is required to ensure consistent lithography process yield for sub-30nm device technologies. As DUV multi-patterning requirements continue to shrink, it is imperative that all sources of lithography variability are controlled throughout the product life-cycle, from technology development to high volume manufacturing. Recent developments of new ArF light-source metrology and monitoring capabilities have been introduced in order to improve lithography patterning control.[1] These technologies enable performance monitoring of new light-source properties, relating to illumination stability, and enable new reporting and analysis of in-line performance.

Paper Details

Date Published: 12 April 2013
PDF: 12 pages
Proc. SPIE 8683, Optical Microlithography XXVI, 86830S (12 April 2013); doi: 10.1117/12.2013213
Show Author Affiliations
Paolo Alagna, Cymer, Inc. (United States)
Cymer, Inc. (Belgium)
Omar Zurita, Cymer, Inc. (Belgium)
Ivan Lalovic, Cymer, Inc. (Belgium)
Nakgeuon Seong, Cymer, Inc. (Belgium)
Gregory Rechsteiner, Cymer, Inc. (Belgium)
Joshua Thornes, Cymer, Inc. (Belgium)
Koen D'havé, IMEC (Belgium)
Lieve Van Look , IMEC (Belgium)
Joost Bekaert , IMEC (Belgium)

Published in SPIE Proceedings Vol. 8683:
Optical Microlithography XXVI
Will Conley, Editor(s)

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