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Proceedings Paper

Implementation of hybrid metrology at HVM fab for 20nm and beyond
Author(s): Alok Vaid; Lokesh Subramany; Givantha Iddawela; Carl Ford; John Allgair; Gaurav Agrawal; John Taylor; Carsten Hartig; Byung Cheol (Charles) Kang; Cornel Bozdog; Matthew Sendelbach; Paul Isbester; Limor Issascharoff
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Paper Abstract

Metrology tools are increasingly challenged by the continuing decrease in the device dimensions, combined with complex disruptive materials and architectures. These demands are not being met appropriately by existing/forthcoming metrology techniques individually. Hybrid Metrology (HM) – the practice to combine measurements from multiple toolset types in order to enable or improve the measurement of one or more critical parameters – is being incorporated by the industry to resolve these challenges. Continuing our previous work we now take the HM from the lab into the fab. This paper presents the first-in-industry implementation of HM within a High Volume Manufacturing (HVM) environment. Advanced 3D applications are the first to use HM: 20nm Contact etch and 14nm FinFET poly etch. The concept and main components of this Phase-1 Host-based implementation are discussed. We show examples of communication protocols/standards that have been specially constructed for HM for sharing data between the metrology tools and fab host in GLOBALFOUNDRIES, as well as the HM recipe setup and HVM results. Finally we discuss our vision and phased progression/roadmap for Phase-2 HM implementation to fully reap the benefits of hybridization.

Paper Details

Date Published: 10 April 2013
PDF: 15 pages
Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 868103 (10 April 2013); doi: 10.1117/12.2012339
Show Author Affiliations
Alok Vaid, GLOBALFOUNDRIES (United States)
Lokesh Subramany, GLOBALFOUNDRIES (United States)
Givantha Iddawela, GLOBALFOUNDRIES (United States)
Carl Ford, GLOBALFOUNDRIES (United States)
John Allgair, GLOBALFOUNDRIES (United States)
Gaurav Agrawal, GLOBALFOUNDRIES (United States)
John Taylor, GLOBALFOUNDRIES (United States)
Carsten Hartig, GLOBALFOUNDRIES (Germany)
Byung Cheol (Charles) Kang, Nova Measuring Instruments, Inc. (United States)
Cornel Bozdog, Nova Measuring Instruments, Inc. (United States)
Matthew Sendelbach, Nova Measuring Instruments, Inc. (United States)
Paul Isbester, Nova Measuring Instruments, Inc. (United States)
Limor Issascharoff, Nova Measuring Instruments Ltd. (Israel)

Published in SPIE Proceedings Vol. 8681:
Metrology, Inspection, and Process Control for Microlithography XXVII
Alexander Starikov; Jason P. Cain, Editor(s)

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