Recently, polymer-bound PAGs (anion bound) are actively investigated as Extreme ultra violet (EUV) resist. Some experimental results showed, in case of shot diffusion length acid generator bounded polymer showed lower sensitivity comparing with long diffusion length acid generator. In our previous investigation, short diffusion length PAG reactivity is changed due to binding to polymer by pulse radiolysis method. However, shot diffusion PAG bound to polymer showed lower LWR than long diffusion length PAG. Therefore, acid diffusion length difference originate in PAG is important to resist performance. The diffusion length difference influence deprotection reaction in PEB process. In this paper, we evaluated polymer-bound PAGs and polymer blend PAGs by electron beam (EB) exposure tool employing various PEB temperature and PEB time to conform the influence of acid diffusion regulation about polymer-bound PAGs for resist performances. As the result, even if acid generator bound polymer applied as a resist, acid diffusion regulation isn’t so strict that acid can migrate in the polymer matrix during PEB.

Date Published: 1 April 2013
PDF: 6 pages
Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 867926 (1 April 2013);

Published in SPIE Proceedings Vol. 8679:
Extreme Ultraviolet (EUV) Lithography IV
Patrick P. Naulleau, Editor(s)