Predicting directed self-assembly (DSA) patterns from given chemoepitaxy or graphoepitaxy directing patterns is a well known direct problem of computational DSA simulations. This paper concentrates on inverse problem of DSA – finding directing graphoepitaxy or chemoepitaxy patterns, resulting in given desired DSA patterns. Approaches to computational solution of inverse DSA problem are discussed, particularly the ones based on a linearization of the DSA model and minimizing the objective function ensuring the formation of the desired DSA patterns. We illustrate these approaches by presenting the results of their application to an inverse DSA problem for contact holes patterned using graphoepitaxy guiding templates.

Date Published: 26 March 2013
PDF: 10 pages
Proc. SPIE 8680, Alternative Lithographic Technologies V, 86800Z (26 March 2013); doi: 10.1117/12.2011575

Published in SPIE Proceedings Vol. 8680:
Alternative Lithographic Technologies V
William M. Tong, Editor(s)