Wet chemical slimming of resist can enable a resist mandrel for sidewall-image transfer (SIT) by decreasing the mandrel width and smoothing the mandrel sidewalls. This would reduce the cost of the SIT process. Several key metrics are used to compare the traditional etched mandrel and the slimmed resist mandrel, including: process window, critical dimension uniformity, and defectivity. New resists are shown to have larger process windows after slimming than an etched mandrel process while maintaining comparable critical dimension uniformity. The major challenge to the resist mandrel is the profile post-slim.

Date Published: 29 March 2013
PDF: 7 pages
Proc. SPIE 8682, Advances in Resist Materials and Processing Technology XXX, 86820E (29 March 2013); doi: 10.1117/12.2011506

Published in SPIE Proceedings Vol. 8682:
Advances in Resist Materials and Processing Technology XXX
Mark H. Somervell, Editor(s)