Share Email Print

Proceedings Paper

MAPPER: progress toward a high-volume manufacturing system
Author(s): G. de Boer; M. P. Dansberg; R. Jager; J. J. M. Peijster; E. Slot; S. W. H. K. Steenbrink; M. J. Wieland
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

MAPPER Lithography is developing a maskless lithography technology based on massively-parallel electron-beam writing with high speed optical data transport for switching the electron beams. In this way optical columns can be made with a throughput of 10 wafers per hour. By clustering several of these systems together high throughputs can be realized in a small footprint. This enables a highly cost-competitive solution for either direct patterning or complementary patterning approach, [1, 2]. For a 10 wph throughput per unit MAPPER will use 13,260 parallel electron beams, delivering 170 μA to the wafer. To realize this large current at the wafer MAPPER uses its patterned beam approach where each beam consists of 49 subbeams [3]. MAPPER is currently realizing its MATRIX platform. This system is one unit in the cluster depicted above and will have a capability of 10 wph (containing the patterned beams approach) and have full overlay capability. One 10 wph unit will have a footprint of 1.1 m x 1.65m. This paper will provide an overview of the development status of this MATRIX platform.

Paper Details

Date Published: 26 March 2013
PDF: 12 pages
Proc. SPIE 8680, Alternative Lithographic Technologies V, 86800O (26 March 2013); doi: 10.1117/12.2011486
Show Author Affiliations
G. de Boer, MAPPER Lithography B. V. (Netherlands)
M. P. Dansberg, MAPPER Lithography B. V. (Netherlands)
R. Jager, MAPPER Lithography B. V. (Netherlands)
J. J. M. Peijster, MAPPER Lithography B. V. (Netherlands)
E. Slot, MAPPER Lithography B. V. (Netherlands)
S. W. H. K. Steenbrink, MAPPER Lithography B. V. (Netherlands)
M. J. Wieland, MAPPER Lithography B. V. (Netherlands)

Published in SPIE Proceedings Vol. 8680:
Alternative Lithographic Technologies V
William M. Tong, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?