Proceedings Paper
A slim column cell of 12nm resolution for wider application of e-beam lithography| Format | Member Price | Non-Member Price |
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Paper Abstract
The authors designed novel electron beam slim column cells that have the outer diameters of 60mm and 40mm in width
for an e-beam exposure of patterns down to 12nm and below. The column has maximum magnetic flux density of less
than 2.2Tesla in the pole-piece of objective lens. No magnetic saturation occurs in the lens. The 12-88% blur at shaped
beam edges through the column is better than 12nm to expose 12nm 1:1 LS patterns. Calorific power by lens coil of the column is smaller than 200watt. This slim column cell of high resolution and small size will provide various types of
electron beam exposure systems with single or multiple exposure columns.
Paper Details
Date Published: 26 March 2013
PDF: 7 pages
Proc. SPIE 8680, Alternative Lithographic Technologies V, 868025 (26 March 2013); doi: 10.1117/12.2011376
Published in SPIE Proceedings Vol. 8680:
Alternative Lithographic Technologies V
William M. Tong, Editor(s)
PDF: 7 pages
Proc. SPIE 8680, Alternative Lithographic Technologies V, 868025 (26 March 2013); doi: 10.1117/12.2011376
Show Author Affiliations
Tomohiko Abe, Advantest Corp. (Japan)
Youichi Shimizu, Advantest Corp. (Japan)
Youichi Shimizu, Advantest Corp. (Japan)
Published in SPIE Proceedings Vol. 8680:
Alternative Lithographic Technologies V
William M. Tong, Editor(s)
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