Directed self-assembly (DSA) of block copolymers (BCP) has attracted significant interest due to its promising potential as the next generation lithography candidate. In this paper we used Self-Consistent-Field-Theory (SCFT) to computationally simulate the equilibrium behavior of self-assembly inside a confinement well, which is also known as graphoepitaxy. More specifically, we studied the DSA of cylinder-forming block copolymers for contact hole/via patterning, mainly focusing on 1-hole DSA pattern inside confinement well. The SCFT simulation results of parametric studies for confinement well sizes ranging from 50nm to 90nm, different polymer film thicknesses and a range of the wall/substrate affinity parameter values, are presented, as well as verified by experiments.

Date Published: 26 March 2013
PDF: 7 pages
Proc. SPIE 8680, Alternative Lithographic Technologies V, 86801L (26 March 2013); doi: 10.1117/12.2011264

Published in SPIE Proceedings Vol. 8680:
Alternative Lithographic Technologies V
William M. Tong, Editor(s)