Proceedings Paper
Design strategy of small topographical guiding templates for sub-15nm integrated circuits contact hole patterns using block copolymer directed self assembly| Format | Member Price | Non-Member Price |
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Paper Abstract
Block copolymer (BCP) directed self-assembly (DSA) is a promising extension of optical
lithography for patterning irregularly positioned contact holes of integrated circuits. The small
topographical templates are shown to guide the self-assembly off the natural geometry by strong
boundary confinement [1-2], and has been demonstrated to pattern 22nm random logic circuits using
[2-3]. Here we present a general template design strategy that relates the DSA material properties to
the target technology node requirements and experimentally demonstrated DSA contact hole
patterning for half adders at the 14 nm and 10 nm nodes.
Paper Details
Date Published: 26 March 2013
PDF: 9 pages
Proc. SPIE 8680, Alternative Lithographic Technologies V, 868010 (26 March 2013); doi: 10.1117/12.2011263
Published in SPIE Proceedings Vol. 8680:
Alternative Lithographic Technologies V
William M. Tong, Editor(s)
PDF: 9 pages
Proc. SPIE 8680, Alternative Lithographic Technologies V, 868010 (26 March 2013); doi: 10.1117/12.2011263
Show Author Affiliations
He Yi, Stanford Univ. (United States)
Xin-Yu Bao, Stanford Univ. (United States)
Applied Materials, Inc. (United States)
Xin-Yu Bao, Stanford Univ. (United States)
Applied Materials, Inc. (United States)
Richard Tiberio, Stanford Univ. (United States)
H.-S. Philip Wong, Stanford Univ. (United States)
H.-S. Philip Wong, Stanford Univ. (United States)
Published in SPIE Proceedings Vol. 8680:
Alternative Lithographic Technologies V
William M. Tong, Editor(s)
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