
Proceedings Paper
Contamination resistant coatings for enhanced laser damage thresholdsFormat | Member Price | Non-Member Price |
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Paper Abstract
This paper describes a novel approach for the suppression of contamination enhanced laser damage to optical
components by the use of fluorinated coatings that repel organic contaminates. In prior work we studied laser damage
thresholds induced by ppm levels of toluene under nanosecond 1.064 μm irradiation of fused silica optics. That work
showed that moderate vapor-phase concentrations (< 15%) of water and alcohols dramatically increased the laser
damage threshold. The data are consistent with the hypothesis that water and alcohols interact more favorably with the
hydroxylated silica surface thereby displacing toluene from the surface. In this work, preliminary results show that
fluorinated self assembled monolayer coatings can be used to accomplish the same effect. Optics coated with
fluorinated films have much higher survival rates compared with uncoated optics under the same conditions. In addition
to enhancing survival of laser optics, these coatings have implications for protecting spacecraft imaging optics from
organic contamination.
Paper Details
Date Published: 4 December 2012
PDF: 6 pages
Proc. SPIE 8530, Laser-Induced Damage in Optical Materials: 2012, 85302A (4 December 2012); doi: 10.1117/12.2011179
Published in SPIE Proceedings Vol. 8530:
Laser-Induced Damage in Optical Materials: 2012
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; M J Soileau, Editor(s)
PDF: 6 pages
Proc. SPIE 8530, Laser-Induced Damage in Optical Materials: 2012, 85302A (4 December 2012); doi: 10.1117/12.2011179
Show Author Affiliations
Bruce H. Weiller, The Aerospace Corp. (United States)
Jesse D. Fowler, The Aerospace Corp. (United States)
Jesse D. Fowler, The Aerospace Corp. (United States)
Randy M. Villahermosa, The Aerospace Corp. (United States)
Published in SPIE Proceedings Vol. 8530:
Laser-Induced Damage in Optical Materials: 2012
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; M J Soileau, Editor(s)
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