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Proceedings Paper

High-productivity immersion scanner enabling 1xnm hp manufacturing
Author(s): Yosuke Shirata; Yuichi Shibazaki; Junichi Kosugi; Takahisa Kikuchi; Yasuhiro Ohmura
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Paper Abstract

NSR-S622D, Nikon’s new ArF immersion scanner, provides the best and practicable solutions to meet the escalating requirement from device manufactures to accommodate the further miniaturization of device pattern. NSR-S622D has various additional functions compared to the previous model such as the newly developed illumination system, new projection lens, new AF system new wafer table in addition to the matured Streamlign platform. These new features will derive the outstanding performance of NSR, enabling highly controlled CD uniformity, focus accuracy and overlay accuracy. NSR-S622D will provide the adequate capabilities that are demanded from a lithography tool for production of 1x nm hp node and beyond.

Paper Details

Date Published: 12 April 2013
PDF: 10 pages
Proc. SPIE 8683, Optical Microlithography XXVI, 86831K (12 April 2013); doi: 10.1117/12.2011123
Show Author Affiliations
Yosuke Shirata, Nikon Corp. (Japan)
Yuichi Shibazaki, Nikon Corp. (Japan)
Junichi Kosugi, Nikon Corp. (Japan)
Takahisa Kikuchi, Nikon Corp. (Japan)
Yasuhiro Ohmura, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 8683:
Optical Microlithography XXVI
Will Conley, Editor(s)

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