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Proceedings Paper

Application specific ratings for lithography process filters
Author(s): Toru Umeda; Shuichi Tsuzuki
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Paper Abstract

The typical performance index of microelectronics-grade filter products is based upon mechanical sieving. However, adsorption also plays a critical role for reducing certain defects. To provide a more accurate metric, a complementary adsorption performance index is introduced for lithography process filters. In this study, heptylamine-substituted palladium nanoparticles were used to simulate the adsorptive characteristics of microbridge defect precursors. Adsorption kinetic parameters were calculated for Nylon 6,6 and HDPE filters that were challenged with the simulation particles. Nylon 6,6 media quantitatively demonstrated superior adsorptive retention characteristics. The new index is expected to guide both filter product development and filter recommendation for next generation lithography processes.

Paper Details

Date Published: 29 March 2013
PDF: 9 pages
Proc. SPIE 8682, Advances in Resist Materials and Processing Technology XXX, 868208 (29 March 2013); doi: 10.1117/12.2010735
Show Author Affiliations
Toru Umeda, Nihon Pall Ltd. (Japan)
Shuichi Tsuzuki, Nihon Pall Ltd. (Japan)

Published in SPIE Proceedings Vol. 8682:
Advances in Resist Materials and Processing Technology XXX
Mark H. Somervell, Editor(s)

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