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Proceedings Paper

Image reversal: a new chemical approach using isoureas
Author(s): James W. Taylor; Thomas L. Brown; David R. Bassett
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Paper Abstract

A dual-tone photoresist that produces positive and negative images has been developed. The chemistry of image reversal is based on novolac-bound isoureas. Isoureas are "blocked" carbodiimides which deblock during postbake to deactivate indenecarboxylic acid groups in the irradiated areas. After postbake, the resist is flood-exposed to convert the remaining photoactive compound in the resist to indenecarboxylic acid groups; development then gives a negative image of the mask.

Paper Details

Date Published: 1 June 1990
PDF: 16 pages
Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); doi: 10.1117/12.20107
Show Author Affiliations
James W. Taylor, Union Carbide Corp. (United States)
Thomas L. Brown, Union Carbide Corp. (United States)
David R. Bassett, Union Carbide Corp. (United States)

Published in SPIE Proceedings Vol. 1262:
Advances in Resist Technology and Processing VII
Michael P. C. Watts, Editor(s)

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