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Proceedings Paper

In-situ develop end point control to eliminate CD variance
Author(s): Mariste Jaffe
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Paper Abstract

Photolithography variables that are still uncontrolled include time between softbake and exposure, time between exposure and develop, relative humidity, and exhaust uniformity. Even if all other variables are in perfect control, these can cause enough variation to put sub-micron CDs out of spec. Changing exposure energies cannot fully compensate. The use of in-situ develop end point control can eliminate CD variance caused by these and other process variations.

Paper Details

Date Published: 1 June 1990
PDF: 14 pages
Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); doi: 10.1117/12.20082
Show Author Affiliations
Mariste Jaffe, Xinix, Inc. (United States)

Published in SPIE Proceedings Vol. 1261:
Integrated Circuit Metrology, Inspection, and Process Control IV
William H. Arnold, Editor(s)

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