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Proceedings Paper

On-line state and model parameter identification of the positive optical photoresist development process
Author(s): Thomas A. Carroll; W. Fred Ramirez
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Paper Abstract

The development phase of the optical photolithography process has long been considered the most crucial, as it is the final image-forming step. Process monitoring methods have focused primarily on end point detection, and have not used other inferable on-line information. This paper examines the use ofinathematical models in conjunction with on-line development penetration data to determine process changes. An on-line sequential parameter identification scheme is used to calculate a current rate parameter value for the development model, and a Kalman filter is used to reduce erroneous observations caused by measurement noise. A powerful development monitor system results from the combination of real-time data and on-line parameter and state estimation theory.

Paper Details

Date Published: 1 June 1990
PDF: 12 pages
Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); doi: 10.1117/12.20075
Show Author Affiliations
Thomas A. Carroll, Univ. of Colorado (United States)
W. Fred Ramirez, Univ. of Colorado (United States)

Published in SPIE Proceedings Vol. 1261:
Integrated Circuit Metrology, Inspection, and Process Control IV
William H. Arnold, Editor(s)

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