Proceedings Paper
A highly accurate engineering of silicon integrated microring resonators based on the nanofabrication technique| Format | Member Price | Non-Member Price |
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Paper Abstract
In this work we present our theoretical and experimental study on the technique for the fine modification of a
silicon integrated microring resonator spectral response. The method involves the local atomic layer deposition
of a thin TiO2 overlayer and is applicable for standard nanophotonic waveguides. The approach is based on the
dispersion management due to the specific dispersion properties brought by the thin TiO2 film deposition. In
addition, the technique is able to partially compensate the fabrication imperfections and reduce the propagation
losses.
Paper Details
Date Published: 14 March 2013
PDF: 6 pages
Proc. SPIE 8629, Silicon Photonics VIII, 86291J (14 March 2013); doi: 10.1117/12.2007266
Published in SPIE Proceedings Vol. 8629:
Silicon Photonics VIII
Joel Kubby; Graham T. Reed, Editor(s)
PDF: 6 pages
Proc. SPIE 8629, Silicon Photonics VIII, 86291J (14 March 2013); doi: 10.1117/12.2007266
Show Author Affiliations
M. Erdmanis, Aalto Univ. (Finland)
L. Karvonen, Aalto Univ. (Finland)
A. Säynätjoki, Aato Univ. (Finland)
L. Karvonen, Aalto Univ. (Finland)
A. Säynätjoki, Aato Univ. (Finland)
Published in SPIE Proceedings Vol. 8629:
Silicon Photonics VIII
Joel Kubby; Graham T. Reed, Editor(s)
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