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Proceedings Paper

Lab-scale EUV nano-imaging employing a gas-puff-target source: image quality versus plasma radiation characteristics
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Paper Abstract

In this chapter we report a desk-top microscopy reaching 50nm spatial resolution in very compact setup using a gas-puff laser plasma EUV source. We present the study of source bandwidth influence on the extreme ultraviolet (EUV) microscope spatial resolution. EUV images of object obtained by illumination with variable bandwidth EUV radiation were compared in terms of knife-edge spatial resolution to study the wide bandwidth parasitic influence on spatial resolution in the EUV microscopy.

Paper Details

Date Published: 11 December 2012
PDF: 10 pages
Proc. SPIE 8678, Short-Wavelength Imaging and Spectroscopy Sources, 867807 (11 December 2012); doi: 10.1117/12.2006090
Show Author Affiliations
Przemyslaw Wachulak, Military Univ. of Technology (Poland)
Andrzej Bartnik, Military Univ. of Technology (Poland)
Henryk Fiedorowicz, Military Univ. of Technology (Poland)

Published in SPIE Proceedings Vol. 8678:
Short-Wavelength Imaging and Spectroscopy Sources
Davide Bleiner, Editor(s)

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