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Proceedings Paper

New alignment system for submicron stepper
Author(s): Shunichi Uzawa; Akiyoshi Suzuki; Naoki Ayata
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Paper Abstract

Recent rapid progress in the semiconductor industry requires much better accuracy for overlay. Today, the overlay accuracy of 0.1 pm is discussed in reality. To guarantee the 0.1 pm overlay for all processes is one target. In order to attain such requirements, the alignment system has been renewed. We have developed a new TV image processing system with high resolution, using real-time twodimentional image processing technology by multi-computer system. Together with TV system, the new alignment system by HeCd and HeNe laser bright field method is implemented, and they showed more extensive flexibility to various types of wafers.

Paper Details

Date Published: 1 June 1990
PDF: 7 pages
Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); doi: 10.1117/12.20058
Show Author Affiliations
Shunichi Uzawa, Canon Inc. (Japan)
Akiyoshi Suzuki, Canon Inc. (Japan)
Naoki Ayata, Canon Inc. (United States)

Published in SPIE Proceedings Vol. 1261:
Integrated Circuit Metrology, Inspection, and Process Control IV
William H. Arnold, Editor(s)

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