
Proceedings Paper
Overlay and linewidth metrology on latent imagesFormat | Member Price | Non-Member Price |
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Paper Abstract
Is there enough contrast under white light illumination to perform
automated metrology on latent or undeveloped photoresist images for
control of the lithographic process? This would be an interesting option
for the next generation photolithograpy cell. To accomplish this under full
automation, several different operations must be carried out: global
alignment which requires a coarse focus and pattern recognition operation
at low optical magnification, pattern recognition and precision autofocus
at high magnigication, and finally precision edge detection at high
magnification all at repeatabilities acceptable to the industry. The first
look answer is yes.
Below we describe the experiments and data carried out on this question.
Paper Details
Date Published: 1 June 1990
PDF: 7 pages
Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); doi: 10.1117/12.20040
Published in SPIE Proceedings Vol. 1261:
Integrated Circuit Metrology, Inspection, and Process Control IV
William H. Arnold, Editor(s)
PDF: 7 pages
Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); doi: 10.1117/12.20040
Show Author Affiliations
Hans Bengtsson, IVS, Inc. (United States)
Don E. Yansen, IVS, Inc. (United States)
Published in SPIE Proceedings Vol. 1261:
Integrated Circuit Metrology, Inspection, and Process Control IV
William H. Arnold, Editor(s)
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