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Proceedings Paper

Precisely controlled plasmonic nanostructures and its application to nanolithography
Author(s): K. Ueno; H. Misawa
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Paper Abstract

Nanoparticles of noble metals show localized surface plasmon resonance. Plasmon resonances which are collective oscillations of conduction electrons give rise to the enhancement of electromagnetic field to the local surface of metallic nanoparticles. Therefore, various plasmonic near-field lithography systems were proposed so far. Here, we report on a plasmon-assisted nanolithography used for the fabrication of nano-patterns with nanometric accuracy. The lithography system can form deep nano-patterns on positive photoresist film using scattering component of multipole plasmon resonances as an exposure light. Two-photon-induced reaction of a photoresist enabled the formation of fine patterns even using plasmonic scattering light.

Paper Details

Date Published: 5 March 2013
PDF: 7 pages
Proc. SPIE 8613, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI, 861302 (5 March 2013); doi: 10.1117/12.2003316
Show Author Affiliations
K. Ueno, Hokkaido Univ. (Japan)
Japan Science and Technology Agency (Japan)
H. Misawa, Hokkaido Univ. (Japan)

Published in SPIE Proceedings Vol. 8613:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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