Proceedings Paper
Thin-film optical constants and multilayer mirror reflectivity in ultrasoft x-ray range| Format | Member Price | Non-Member Price |
|---|---|---|
| $17.00 | $21.00 |
Paper Abstract
Optical constants of Si, C, Mo, and Nb thin films as well as of fused quartz and float glass substrates have been determined experimentally in the (lambda) approximately equals 80 - 190 angstrom wavelength range. The dependence of optical constants on film thickness and film production technology is demonstrated. The factors influencing substance permittivity in the soft x-ray range are discussed. It is discovered that the main of them is the presence of impurities introduced into the film during its deposition. The chemical composition of multilayer Mo-Si x-ray mirrors is studied. It is shown that if O, N, and Ar impurities in Si films are taken into account, the available experimental data on the reflectivity and resolution of Mo-Si mirrors in the soft x-ray range can be described quantitatively.
Paper Details
Date Published: 23 January 1995
PDF: 14 pages
Proc. SPIE 2453, X-Ray Optics and Surface Science, (23 January 1995); doi: 10.1117/12.200280
Published in SPIE Proceedings Vol. 2453:
X-Ray Optics and Surface Science
Alexander V. Vinogradov, Editor(s)
PDF: 14 pages
Proc. SPIE 2453, X-Ray Optics and Surface Science, (23 January 1995); doi: 10.1117/12.200280
Show Author Affiliations
Igor V. Kozhevnikov, P.N. Lebedev Physical Institute (Russia)
L. L. Balakireva, P.N. Lebedev Physical Institute (Russia)
I. I. Lyakhovskaya, St. Petersburg Univ. (Russia)
A. I. Parobets, St. Petersburg Univ. (Russia)
V. V. Kondratenko, Kharkov Polytechnical Institute (Ukraine)
Yurii P. Pershin, Kharkov Polytechnical Institute (Ukraine)
A. G. Ponomarenko, Kharkov Polytechnical Institute (Ukraine)
Anatoli I. Fedorenko, Kharkov Polytechnical Institute (Ukraine)
L. L. Balakireva, P.N. Lebedev Physical Institute (Russia)
I. I. Lyakhovskaya, St. Petersburg Univ. (Russia)
A. I. Parobets, St. Petersburg Univ. (Russia)
V. V. Kondratenko, Kharkov Polytechnical Institute (Ukraine)
Yurii P. Pershin, Kharkov Polytechnical Institute (Ukraine)
A. G. Ponomarenko, Kharkov Polytechnical Institute (Ukraine)
Anatoli I. Fedorenko, Kharkov Polytechnical Institute (Ukraine)
Vladimir E. Levashov, P.N. Lebedev Physical Institute (Russia)
Spartak I. Sagitov, P.N. Lebedev Physical Institute (Russia)
O. I. Tolstikhin, P.N. Lebedev Physical Institute (Russia)
V. A. Chirkov, P.N. Lebedev Physical Institute (Russia)
L. A. Babaeva, NIOPIK Research Institute (Russia)
Tatjana M. Ivanova, NIOPIK Research Institute (Russia)
Alexander V. Vinogradov, P.N. Lebedev Physical Institute (Russia)
Spartak I. Sagitov, P.N. Lebedev Physical Institute (Russia)
O. I. Tolstikhin, P.N. Lebedev Physical Institute (Russia)
V. A. Chirkov, P.N. Lebedev Physical Institute (Russia)
L. A. Babaeva, NIOPIK Research Institute (Russia)
Tatjana M. Ivanova, NIOPIK Research Institute (Russia)
Alexander V. Vinogradov, P.N. Lebedev Physical Institute (Russia)
Published in SPIE Proceedings Vol. 2453:
X-Ray Optics and Surface Science
Alexander V. Vinogradov, Editor(s)
© SPIE. Terms of Use
