
Proceedings Paper
Fabrication of low-loss silicon nanophotonic waveguide for photonic device integrationFormat | Member Price | Non-Member Price |
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Paper Abstract
As the basic building block for photonic device integration, silicon nanophotonic waveguide requires low-loss
propagation for high-performance ultra-compact photonic device. We experimentally study SiO2 grown by two different
methods (thermal oxidation and PECVD) as hard masks for Si nano-waveguides fabrication and study their effects on
propagation loss. It was found that the denser and smoother quality of thermally grown SiO2 will increase the etch
selectivity of Si and reduce the line-edge roughness transferred to the Si nanowaveguide sidewall, hence giving a lower
loss compared to having PECVD SiO2 hard mask. With thermally grown SiO2 as hard mask, the Si nano-waveguides
loss can have a loss reduction as high as 5.5 times for a 650 nm wide nanowaveguide. Using thermally grown SiO2 as
hard mask will allow the Si nano-waveguide to have as low a propagation loss as direct resist mask and enable III-V
semiconductor on silicon via bonding for multifunctional photonic system on chip.
Paper Details
Date Published: 14 March 2013
PDF: 5 pages
Proc. SPIE 8629, Silicon Photonics VIII, 86290E (14 March 2013); doi: 10.1117/12.2002791
Published in SPIE Proceedings Vol. 8629:
Silicon Photonics VIII
Joel Kubby; Graham T. Reed, Editor(s)
PDF: 5 pages
Proc. SPIE 8629, Silicon Photonics VIII, 86290E (14 March 2013); doi: 10.1117/12.2002791
Show Author Affiliations
Doris K. T. Ng, Data Storage Institute (Singapore)
Kim-Peng Lim, Data Storage Institute (Singapore)
Qian Wang, Data Storage Institute (Singapore)
Jing Pu, Data Storage Institute (Singapore)
Kim-Peng Lim, Data Storage Institute (Singapore)
Qian Wang, Data Storage Institute (Singapore)
Jing Pu, Data Storage Institute (Singapore)
Kun Tang, Data Storage Institute (Singapore)
Yicheng Lai, Data Storage Institute (Singapore)
Chee-Wei Lee, Data Storage Institute (Singapore)
Seng-Tiong Ho, Data Storage Institute (Singapore)
Northwestern Univ. (United States)
Yicheng Lai, Data Storage Institute (Singapore)
Chee-Wei Lee, Data Storage Institute (Singapore)
Seng-Tiong Ho, Data Storage Institute (Singapore)
Northwestern Univ. (United States)
Published in SPIE Proceedings Vol. 8629:
Silicon Photonics VIII
Joel Kubby; Graham T. Reed, Editor(s)
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