A combination of electron- and ion-beam lithographies has been applied to fabricate patterns of plasmonic nanoparticles having tailored optical functions: they create hot-spots at predefined locations on the nanoparticle at specific wavelengths and polarizations of the incident light field. Direct inscribing of complex chiral patterns into uniform nano-disks of sub-wavelength dimensions, over extensive 20-by-20 μm² areas, is achieved with high fidelity and efficiency; typical groove widths are in 10-30 nm range. Such patterns can perform optical manipulation functions like nano-tweezing and chiral sorting. Fabrication procedures can be optimized to pattern thin 0.1-2.5 μm-thick membranes with chiral nanoparticles having sub-15 nm grooves. Peculiarities of optical force and torque calculations using finite-difference time-domain method are presented.

Date Published: 5 March 2013
PDF: 13 pages
Proc. SPIE 8613, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI, 861304 (5 March 2013); doi: 10.1117/12.2002281

Published in SPIE Proceedings Vol. 8613:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)