
Proceedings Paper
High-quality surface micromachining of LiNbO3 by ion implantation-assisted etchingFormat | Member Price | Non-Member Price |
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Paper Abstract
A surface micromachining technique of LiNbO3 substrates, based on an improved implantation-assisted wet etching process, will be presented and discussed. 2.3 μm high relief structures with optical quality surfaces were fabricated on LiNbO3 by 5 MeV Cu ion implantation through an SU-8 10 μm thick photoresist masking layer patterned by a standard photolithographic process. The LiNbO3 regions amorphized by implantation were etched in a 49% HF aqueous solution at a rate of 100 nm/s exploiting the high differential etching rate between damaged and undamaged LiNbO3 (100 nm/s against 1 nm/s). The process can be repeated to obtain higher aspect ratios. In this work the results of both single and double step processes will be presented. The sidewalls morphology of the microstructures will be also discussed. Both the surface quality and features of the manufactured structures make this technology highly promising for integrated optics and acousto/opto-fluidics.
Paper Details
Date Published: 9 March 2013
PDF: 8 pages
Proc. SPIE 8612, Micromachining and Microfabrication Process Technology XVIII, 86120E (9 March 2013); doi: 10.1117/12.2002095
Published in SPIE Proceedings Vol. 8612:
Micromachining and Microfabrication Process Technology XVIII
Mary Ann Maher; Paul J. Resnick, Editor(s)
PDF: 8 pages
Proc. SPIE 8612, Micromachining and Microfabrication Process Technology XVIII, 86120E (9 March 2013); doi: 10.1117/12.2002095
Show Author Affiliations
Simone Sugliani, MIST E-R (Italy)
Pietro De Nicola, MIST E-R (Italy)
Giovanni Battista Montanari, MIST E-R (Italy)
Alessio Nubile, MIST E-R (Italy)
Angela Menin, MIST E-R (Italy)
Fulvio Mancarella, CNR-Istituto per la Microelettronica e Microsistemi (Italy)
Paolo Vergani, Oclaro, Inc. (Italy)
Andrea Meroni, Oclaro, Inc. (Italy)
Pietro De Nicola, MIST E-R (Italy)
Giovanni Battista Montanari, MIST E-R (Italy)
Alessio Nubile, MIST E-R (Italy)
Angela Menin, MIST E-R (Italy)
Fulvio Mancarella, CNR-Istituto per la Microelettronica e Microsistemi (Italy)
Paolo Vergani, Oclaro, Inc. (Italy)
Andrea Meroni, Oclaro, Inc. (Italy)
Marco Astolfi, Oclaro, Inc. (Italy)
Marco Borsetto, Oclaro, Inc. (Italy)
Guido Consonni, Oclaro, Inc. (Italy)
Roberto Longone, Oclaro, Inc. (Italy)
Marco Chiarini, MIST E-R (Italy)
CGS S.p.A. (Italy)
Marco Bianconi, MIST E-R (Italy)
CNR-Istituto per la Microelettronica e Microsistemi (Italy)
Gian Giuseppe Bentini, MIST E-R (Italy)
CNR-Istituto per la Microelettronica e Microsistemi
Marco Borsetto, Oclaro, Inc. (Italy)
Guido Consonni, Oclaro, Inc. (Italy)
Roberto Longone, Oclaro, Inc. (Italy)
Marco Chiarini, MIST E-R (Italy)
CGS S.p.A. (Italy)
Marco Bianconi, MIST E-R (Italy)
CNR-Istituto per la Microelettronica e Microsistemi (Italy)
Gian Giuseppe Bentini, MIST E-R (Italy)
CNR-Istituto per la Microelettronica e Microsistemi
Published in SPIE Proceedings Vol. 8612:
Micromachining and Microfabrication Process Technology XVIII
Mary Ann Maher; Paul J. Resnick, Editor(s)
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