
Proceedings Paper
Piezoelectric resonant micromirror with high frequency and large deflection applying mechanical leverage amplificationFormat | Member Price | Non-Member Price |
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Paper Abstract
This paper presents design, fabrication and measurements for single-axis piezoelectric MEMS micromirrors with 1 mm2 apertures. These micromirrors, which feature thin-film PZT actuators and mechanical leverage amplification, are dedicated for laser projection and meet the requirements of high resonant frequency and large deflection angles. To identify the optimal micromirror geometries a parametric study by means of FEM simulations and analytic modeling has been performed. Characterization, related to the material qualities of PZT and the mechanical performance of the micromirrors, have verified the reliability of the process, the robustness and the performance of the fabricated prototypes. According to the measurements the fabricated micromirrors feature high Q-factor about 1570. The micromirror reaches the θopt·D product of 42.5 °·mm at 32 kHz driven by a low voltage of 7 V. Furthermore, new designs with larger apertures and deflections are currently being developed.
Paper Details
Date Published: 9 March 2013
PDF: 8 pages
Proc. SPIE 8612, Micromachining and Microfabrication Process Technology XVIII, 86120I (9 March 2013); doi: 10.1117/12.2001620
Published in SPIE Proceedings Vol. 8612:
Micromachining and Microfabrication Process Technology XVIII
Mary Ann Maher; Paul J. Resnick, Editor(s)
PDF: 8 pages
Proc. SPIE 8612, Micromachining and Microfabrication Process Technology XVIII, 86120I (9 March 2013); doi: 10.1117/12.2001620
Show Author Affiliations
S. Gu-Stoppel, Fraunhofer Institute for Silicon Technology (Germany)
J. Janes, Fraunhofer Institute for Silicon Technology (Germany)
D. Kaden, Fraunhofer Institute for Silicon Technology (Germany)
J. Janes, Fraunhofer Institute for Silicon Technology (Germany)
D. Kaden, Fraunhofer Institute for Silicon Technology (Germany)
H. J. Quenzer, Fraunhofer Institute for Silicon Technology (Germany)
U. Hofmann, Fraunhofer Institute for Silicon Technology (Germany)
W. Benecke, Fraunhofer Institute for Silicon Technology (Germany)
U. Hofmann, Fraunhofer Institute for Silicon Technology (Germany)
W. Benecke, Fraunhofer Institute for Silicon Technology (Germany)
Published in SPIE Proceedings Vol. 8612:
Micromachining and Microfabrication Process Technology XVIII
Mary Ann Maher; Paul J. Resnick, Editor(s)
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