
Proceedings Paper
Tunable nano-pattern generation based on surface plasmon polaritonsFormat | Member Price | Non-Member Price |
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Paper Abstract
We present a numerical observation of a tunable 1D and 2D nano-pattern generation and
photolithography technique based on a surface plasmon resonant cavity formed by a metallic grating
and a metallic thin-film layer separated by a photoresist layer. The tuning capability is implemented by
varying the cavity length combined with the polarization of the incident light, from which different
surface plasmon interferometric patterns can be generated in the cavity of photoresist layer with a fixed
phase mask. The technique opens a new possibility to generate tunable ultra-deep subwavelength
patterns by using a fixed diffraction-limited mask with capability of large area, deep exposure depth
and flexibility of arbitrary 2D patterns.
Paper Details
Date Published: 26 November 2012
PDF: 9 pages
Proc. SPIE 8556, Holography, Diffractive Optics, and Applications V, 85560G (26 November 2012); doi: 10.1117/12.2001367
Published in SPIE Proceedings Vol. 8556:
Holography, Diffractive Optics, and Applications V
Yunlong Sheng; Chongxiu Yu; Linsen Chen, Editor(s)
PDF: 9 pages
Proc. SPIE 8556, Holography, Diffractive Optics, and Applications V, 85560G (26 November 2012); doi: 10.1117/12.2001367
Show Author Affiliations
Yiming Lou, Soochow Univ. (China)
Bing Cao, Soochow Univ. (China)
Bing Cao, Soochow Univ. (China)
Published in SPIE Proceedings Vol. 8556:
Holography, Diffractive Optics, and Applications V
Yunlong Sheng; Chongxiu Yu; Linsen Chen, Editor(s)
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