
Proceedings Paper
Observation of silicon-mediated alleviation of cadmium stress in maize (Zea mays L.) seedlings via LED-induced chlorophyll fluorescenceFormat | Member Price | Non-Member Price |
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Paper Abstract
LED-induced chlorophyll fluorescence analysis is exploited to observe, and monitor the time evolution of silicon-induced alleviation of toxicity in maize (Zea mays L.) seedlings in cadmium contaminated soil. Red, and far-red
emissions were examined as a function of cadmium-silicon concentrations, during the 20 days period of the seedlings
growing process under stress. The chlorophyll fluorescence spectral analysis provided detection, and evaluation of the
damage imposed by the metal stress in the early stages of the plant growing process. The technique also provided the
time evolution evaluation of the silicon-induced tolerance enhancement of maize plants to cadmium, which is not viable using conventional in vitro spectral analysis techniques
Paper Details
Date Published: 22 February 2013
PDF: 9 pages
Proc. SPIE 8587, Imaging, Manipulation, and Analysis of Biomolecules, Cells, and Tissues XI, 85871Q (22 February 2013); doi: 10.1117/12.2000716
Published in SPIE Proceedings Vol. 8587:
Imaging, Manipulation, and Analysis of Biomolecules, Cells, and Tissues XI
Daniel L. Farkas; Dan V. Nicolau; Robert C. Leif, Editor(s)
PDF: 9 pages
Proc. SPIE 8587, Imaging, Manipulation, and Analysis of Biomolecules, Cells, and Tissues XI, 85871Q (22 February 2013); doi: 10.1117/12.2000716
Show Author Affiliations
Artur S. Gouveia-Neto, Univ. Federal Rural de Pernambuco (Brazil)
Elias A. Silva Jr., Univ. Federal Rural de Pernambuco (Brazil)
Elias A. Silva Jr., Univ. Federal Rural de Pernambuco (Brazil)
Airon José da Silva, Univ. Federal Rural de Pernambuco (Brazil)
Clístenes W. A. do Nascimento, Univ. Federal Rural de Pernambuco (Brazil)
Clístenes W. A. do Nascimento, Univ. Federal Rural de Pernambuco (Brazil)
Published in SPIE Proceedings Vol. 8587:
Imaging, Manipulation, and Analysis of Biomolecules, Cells, and Tissues XI
Daniel L. Farkas; Dan V. Nicolau; Robert C. Leif, Editor(s)
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