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Proceedings Paper

Analysis and evaluation of pyrolysis products collected during in vivo treatment of polyps using the Nd:YAG laser
Author(s): Wolfgang Waesche; Verena Knappe; M. Linnartz; Gerhard J. Mueller
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Paper Abstract

A common application of the Neodymium:YAG laser (1064 nm) is the treatment of nasal polyps. The polyps are treated endoscopically with laser power settings of 5 to 10 watts delivered via a flexible fiber with a core diameter of 600 micrometers . Coagulation and vaporization are accompanied by a severe development of dust and plume during the treatment. These products are normally aspirated during the treatment together with cooling fluent via the working channel of the endoscope. Due to the rather low efficiency of the aspiration the products are partly aspirated by the patient. Volatile organic compounds (VOC) were adsorbed and evaluated with a gas chromatography system (GC). The calibration of the system together with geometrical considerations of the adsorption allows for a quantitative determination of several products. Among these toluene is used as a marker substance. Besides the plume samples collected during the treatment of polyps investigations of VOCs were carried out of samples received during Nd:YAG laser treatment of nasal warts and CO2 laser treatment of leucoplakia. The evaluated data led to an estimation of the patient's health risk assuming aspiration of the products by the patient. Improvements of the aspiration system are suggested.

Paper Details

Date Published: 18 January 1995
PDF: 7 pages
Proc. SPIE 2323, Laser Interaction with Hard and Soft Tissue II, (18 January 1995); doi: 10.1117/12.199239
Show Author Affiliations
Wolfgang Waesche, Freie Univ. Berlin (Germany)
Verena Knappe, Freie Univ. Berlin (Germany)
M. Linnartz, Universitaetsklinikum Benjamin Franklin (Germany)
Gerhard J. Mueller, Laser-Medizin-Zentrum GmbH (Germany)

Published in SPIE Proceedings Vol. 2323:
Laser Interaction with Hard and Soft Tissue II
Hans Joerg Albrecht; Guy P. Delacretaz; Thomas H. Meier; Rudolf W. Steiner; Lars Othar Svaasand; Martin J. C. van Gemert, Editor(s)

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